| Names | |
|---|---|
|
Preferred IUPAC name
Gallium arsenide
|
|
| Identifiers | |
|
1303-00-0 |
|
| 3D model (Jmol) | Interactive image |
| ChemSpider |
14087 |
| ECHA InfoCard | 100.013.741 |
| EC Number | 215-114-8 |
| MeSH | gallium+arsenide |
| PubChem | 14770 |
| RTECS number | LW8800000 |
| UN number | 1557 |
|
|
|
|
| Properties | |
| GaAs | |
| Molar mass | 144.645 g/mol |
| Appearance | Very dark red, vitreous crystals |
| Odor | garlic-like when moistened |
| Density | 5.3176 g/cm3 |
| Melting point | 1,238 °C (2,260 °F; 1,511 K) |
| insoluble | |
| Solubility | soluble in HCL insoluble in ethanol, methanol, acetone |
| Band gap | 1.424 eV (at 300 K) |
| Electron mobility | 8500 cm2/(V·s) (at 300 K) |
| Thermal conductivity | 0.55 W/(cm·K) (at 300 K) |
|
Refractive index (nD)
|
3.8 |
| Structure | |
| Zinc blende | |
| T2d-F-43m | |
|
a = 565.35 pm
|
|
| Tetrahedral | |
| Linear | |
| Hazards | |
| Safety data sheet | External MSDS |
| GHS pictograms |
|
| GHS signal word | DANGER |
| H301, H331, H410 | |
| P261, P273, P301+310, P311, P501 | |
|
EU classification (DSD)
|
|
| R-phrases | R23/25, R50/53 |
| S-phrases | (S1/2), S20/21, S28, S45, S60, S61 |
| NFPA 704 | |
|
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
|
|
|
|
|
| Infobox references | |
Gallium arsenide (GaAs) is a compound of the elements gallium and arsenic. It is a III-V direct bandgap semiconductor with a zinc blende crystal structure.
Gallium arsenide is used in the manufacture of devices such as microwave frequency integrated circuits, monolithic microwave integrated circuits, infrared light-emitting diodes, laser diodes, solar cells and optical windows.
GaAs is often used as a substrate material for the epitaxial growth of other III-V semiconductors including indium gallium arsenide, aluminum gallium arsenide and others.
In the compound, gallium has a +3 oxidation state. Gallium arsenide single crystals can be prepared by three industrial processes:
Alternative methods for producing films of GaAs include:
Oxidation of GaAs occurs in air and degrades performance of the semiconductor. The surface can be passivated by depositing a cubic gallium(II) sulfide layer using a tert-butyl gallium sulfide compound such as (t
BuGaS)
7.